发明名称 CHEMICALLY AMPLIFIED RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition suitable for ArF or KrF excimer laser lithography, having various good resist performances such as sensitivity and resolution and giving particularly improved line edge roughness. <P>SOLUTION: The chemically amplified positive resist composition comprises a resin which is insoluble or slightly soluble itself in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by formula (I) wherein R<SB>1</SB>-R<SB>4</SB>are each independently a linear or branched 1-4C hydrocarbon group, R<SB>5</SB>and R<SB>6</SB>are each independently an aliphatic hydrocarbon group having a 5-20C alicyclic structure; n is an integer of 0-6; and when n is 0, a single bond is present. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003280200(A) 申请公布日期 2003.10.02
申请号 JP20020082963 申请日期 2002.03.25
申请人 SUMITOMO CHEM CO LTD 发明人 ARAKI KO;FUJISHIMA HIROAKI;NAKANISHI HIROTOSHI
分类号 G03F7/039;G03F7/004;H01L21/027 主分类号 G03F7/039
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