发明名称 SYNTHETIC QUARTZ GLASS
摘要 <p>A synthetic quartz glass for use in a unit using ultraviolet rays of 150 to 190 nm wavelength as a light source, which is excellent in resistance to ultraviolet rays of 150 to 190 nm wavelength. A synthetic quartz glass used for rays of 150 to 200 nm wavelength, characterized in that in the synthetic quartz glass, the concentration of OH groups is less than 1 ppm, the concentration of oxygen excess type defects is 1 x 10<16> defects/cm<3> or less, the concentration of hydrogen molecules is less than 1 x 10<17> molecules/cm<3>, and the concentration of noncrosslinked oxygen radicals, exhibited after 3 kJ/cm<2> irradiation with xenon excimer lamp light at an illumination intensity of 10 mW/cm<2> or after 10<7> pulse irradiation with F<2> laser beams at an energy density of 10 mJ/cm<2>/pulse, is 1 x 10<16> radicals/cm<3> or less.</p>
申请公布号 WO03080526(A1) 申请公布日期 2003.10.02
申请号 WO2003JP03759 申请日期 2003.03.26
申请人 JAPAN SCIENCE AND TECHNOLOGY CORPORATION;ASAHI GLASS CO.,LTD;HOSONO, HIDEO;KAJIHARA, KOUICHI;HIRANO, MASAHIRO;IKUTA, YOSHIAKI;KIKUKAWA, SHINYA 发明人 HOSONO, HIDEO;KAJIHARA, KOUICHI;HIRANO, MASAHIRO;IKUTA, YOSHIAKI;KIKUKAWA, SHINYA
分类号 C03B20/00;C03B8/04;C03B19/14;C03C3/06;C03C23/00;G02B1/02;G03F7/20;(IPC1-7):C03C3/06 主分类号 C03B20/00
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