发明名称 PLASMA TREATMENT METHOD, SYSTEM FOR JUDGING CLEANING, SYSTEM FOR SELECTING CLEANING RECIPE, PROGRAM, AND INFORMATION MEMORY MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment method which can perform cleaning according to degrees of contamination, a system for judging cleaning, a system for selecting a cleaning recipe, a program, and an information memory medium. SOLUTION: The plasma treatment method includes a process step of detecting the degrees of the contamination within a plasma treatment chamber 10, and a process step of judging whether the cleaning is performed or not in accordance with the degrees of the contamination and criteria as to whether the cleaning is to be performed or not. The method further includes a step of selecting the cleaning recipe to be applied in cleaning from among the cleaning recipes in accordance with the degrees of the contamination and a step of performing the cleaning of the plasma treatment chamber in accordance with the selected cleaning recipe in the case of judging the performance of cleaning. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003277935(A) 申请公布日期 2003.10.02
申请号 JP20020075693 申请日期 2002.03.19
申请人 SEIKO EPSON CORP 发明人 DENDA ATSUSHI
分类号 C23C16/44;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23C16/44;H01L21/306 主分类号 C23C16/44
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