发明名称 METHODS AND COMPOSITIONS FOR OXIDE PRODUCTION ON COPPER
摘要 The invention features and methods and compositions for oxide production on a Copper substrate, e.g., a Copper or Copper alloy substrate, to provide for improved adhesion of Copper substrate to polymeric material, e.g., such as used in manufacture of printed circuit boards. The oxide-producing compositions of the invention, which may be either acidic or ammoniacal, comprise 1) a source of Cu++ (Cupric) ions; 2) a source of a primary electrolyte that is non-interactive with Copper ions; 3) a Cuprous ligand, e.g., a halide ion, preferably chloride, which also serves as a secondary electrolyte; and 4) an optional organic. Acidic oxide-producing compositions comprise a strong acid as the primary electrolyte. The primary electrolyte of ammoniacal oxide-producing compositions is a non-interactive, ammonium salt of acid, which provides a highly soluble Cupric ammonium salt. The secondary electrolyte of the oxide-producing compositions is selected so as to be compatible with the primary electrolyte.
申请公布号 WO03076685(A1) 申请公布日期 2003.09.18
申请号 WO2003US06815 申请日期 2003.03.04
申请人 RD CHEMICAL COMPANY;COLE, JOSEPH;SEDLAK, RUDOLF, P. 发明人 COLE, JOSEPH;SEDLAK, RUDOLF, P.
分类号 C23C22/52;C23C22/63;H05K3/38;(IPC1-7):C23C22/00 主分类号 C23C22/52
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