发明名称 |
Apparatus for controlling and/or measuring additive concentration in an electroplating bath |
摘要 |
A method for measuring a target constituent of an electroplating solution using an electroanalytical technique is set forth in which the electroplating solution includes one or more constituents whose by-products skew an initial electrical response to an energy input of the electroanalytical technique. The method comprises a first step in which an electroanalytical measurement cycle of the target constituent is initiated by providing an energy input to a pair of electrodes disposed in the electroplating solution. The energy input to the pair of electrodes is provided for at least a predetermined time period corresponding to a time period in which the electroanalytical measurement cycle reaches a steady-state condition. In a subsequent step, an electroanalytical measurement of the energy output of the electroanalytical technique is taken after the electroanalytical measurement cycle has reached the steady-state condition. The electroanalytical measurement is then used to determine an amount of the target constituent in the electroplating solution. An automatic dosing system that includes the foregoing method and/or one or more known electroanalytical techniques in a close-loop system is also set forth.
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申请公布号 |
US2003173224(A1) |
申请公布日期 |
2003.09.18 |
申请号 |
US20030372955 |
申请日期 |
2003.02.26 |
申请人 |
GRAHAM LYNDON W.;TAYLOR THOMAS C.;RITZDORF THOMAS L.;LINDBERG FREDRICK A.;CARPENTER BRADLEY C. |
发明人 |
GRAHAM LYNDON W.;TAYLOR THOMAS C.;RITZDORF THOMAS L.;LINDBERG FREDRICK A.;CARPENTER BRADLEY C. |
分类号 |
G01N27/416;G01N27/48;G01N27/49;(IPC1-7):G01N27/26;C25D5/00 |
主分类号 |
G01N27/416 |
代理机构 |
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地址 |
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