发明名称 Semiconductor device and fabrication method of the same
摘要 A semiconductor device and a fabrication method of the same are proposed, in which at least one electronic component is firstly mounted on a first substrate, and then the first substrate is attached onto a semiconductor chip or a second substrate. Further, with the chip being deposited on the second substrate, electrical connection is established among the first substrate, the second substrate and the chip. This combined structure is subsequently subjected to molding, ball implantation and singulation processes, and thus completes the fabrication of the semiconductor device. Such a semiconductor device provides significant advantages, including prevention of the occurrence of wire short-circuiting, no need to alter the substrate design, no need to use a circuit pattern with fine pitches or an expensive substrate integrated with electronic components.
申请公布号 US2003173680(A1) 申请公布日期 2003.09.18
申请号 US20030411457 申请日期 2003.04.10
申请人 SILICONWARE PRECISION INDUSTRIES CO., LTD. 发明人 LIAO CHIH-CHIN;PU HAN-PING;HUANG CHIEN-PING
分类号 H01L23/495;H01L23/50;H01L25/065;H01L25/16;(IPC1-7):H01L21/44 主分类号 H01L23/495
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