发明名称 Method for fabricating a magnetoresistive film and magnetoresistive film
摘要 A double perovskite type oxide film is formed on a given single crystalline substrate. Then, the oxide film in set in an oxygen-including atmosphere, thereby to be oxidized. As a result, oxygen is introduced excessively into the oxide film, to form half metal/insulator/half metal junction and thus, create a MR effect therein.
申请公布号 US2003170484(A1) 申请公布日期 2003.09.11
申请号 US20030346027 申请日期 2003.01.17
申请人 NAGOYA UNIVERSITY 发明人 MORITOMO YUTAKA;LIU XIAOJUN
分类号 H01F10/20;G01R33/09;G11B5/39;H01F10/193;H01F10/32;H01F41/18;H01F41/22;H01F41/30;H01L43/08;H01L43/10;H01L43/12;(IPC1-7):B05D5/12 主分类号 H01F10/20
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