| 发明名称 |
MULTILAYER PHOTOSENSITIVE RESIN FILM AND INSULATING FILM COMPRISING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multilayer photosensitive resin film having excellent adhesiveness to a supporting substrate and a method for producing the same. <P>SOLUTION: In the multilayer photosensitive resin film formed on a supporting substrate, the first layer which is in contact with the substrate comprises a polyamic acid having a repeating unit represented by formula (I). <P>COPYRIGHT: (C)2003,JPO |
| 申请公布号 |
JP2003255534(A) |
申请公布日期 |
2003.09.10 |
| 申请号 |
JP20020054434 |
申请日期 |
2002.02.28 |
| 申请人 |
MITSUI CHEMICALS INC |
发明人 |
KAMATA JUN;GOTO KENICHI;TAJIMA TAKUO;TAMAI MASAJI |
| 分类号 |
G03F7/038;C08G73/10;G03F7/004;G03F7/095;G03F7/11;H01L21/027 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
