| 摘要 |
The present invention provides a synthesis method of graphene, in which foreign materials attached to graphene can be removed effectively by washing the synthesized graphene with an alkaline washing solution during synthesis of graphene. The synthesis method of graphene according to the present invention comprises: a step for attaching synthesized graphene on a film; a step for washing the graphene attached on the film with an alkaline washing solution to remove foreign materials attached on the graphene; a step for drying the graphene attached on the film to remove the alkaline washing solution from the graphene; and a step for releasing the graphene from the film. By washing the graphene attached on the film with the alkaline washing solution, the synthesis method of graphene according to the present invention can effectively remove various foreign materials, such as organic materials including residual resin on the film and graphene, or materials attached on the graphene during an etching process (metal ions from catalysts, ions in etching solutions, etc.). |
