发明名称 REFLECTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a reflective projection optical system having a simple configuration and excellent imaging performance, and to provide an exposure device and a method for manufacturing a device. SOLUTION: In the reflective projection optical system which projects a pattern on an object surface on an image surface, an imaging system to form an intermediate image on the way has four or more mirrors arranged so as to fundamentally form a coaxial system while sequentially reflecting light from an object side on the image surface, and directions for forming a reflection angle are the same on the reflection planes of the four or more mirrors. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003233005(A) 申请公布日期 2003.08.22
申请号 JP20020030623 申请日期 2002.02.07
申请人 CANON INC 发明人 TERASAWA CHIAKI
分类号 G02B17/00;G02B17/06;G02B27/18;G03F7/20;H01L21/027;(IPC1-7):G02B17/00 主分类号 G02B17/00
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