| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas blow-out plate of plasma etching device in which its surface is not corroded by plasma, its thickness can be made thin and the backflow of plasma can be prevented. SOLUTION: The gas blow-out plate of a plasma etching device constituting a part of electrode and capable of passing reaction gas internally has one major surface provided with lattice-like grooves and a large number of through holes are made at lattice points or in the vicinity thereof. COPYRIGHT: (C)2003,JPO
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