| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide excellent quartz glass and ceramic parts which are used in a film-forming device and in a precleaning device of a substrate of a semiconductor, of which the deposited film-shaped material has a high adhesive property and high plasma resistance and which can be continuously used for a long time. <P>SOLUTION: In the quartz glass and ceramic parts which are used in the film-forming device and in the precleaning device of the semiconductor, the surfaceses of which are covered with a ceramic thermally sprayed film and which have surface roughness Ra controlled between 5 μm and 20 μm, have the high adhesive property of the film-shaped material, the parts having the surface roughness Ra controlled between 1 μm and 5 μm have high plasma resistance. Further the parts in which a groove-shape having large anchor effect toward the thermally sprayed film is formed on a surface of a base material where the ceramic thermally sprayed film is formed, cause no exfoliation of the ceramic thermally sprayed film itself from the base material and have high durability. <P>COPYRIGHT: (C)2003,JPO |
