发明名称 DEVICE FOR TREATING PLATING WASHING WASTE LIQUID AND TREATMENT METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a closed circulation system plating washing waste liquid treatment system with no flowing out of the plating washing waste water having a constitution that the plating washing waste liquid is firstly divided to a solvent (water) contained in the washing waste liquid and a concentrated liquid of a non-volatile component (waste material), i.e., the washing waste liquid or a slurry and waster in the distilled/ captured washing waste liquid is circulated and recycled to the plating step as clean water. SOLUTION: In the system for treating the plating washing waste liquid, the plating washing waste liquid a discharged from a plating device 01 is fed to a first vacuum drying device 041, water contained in the plating washing waste liquid is only distilled and removed and a concentration of the washing waste liquid is carried out. The concentrated plating washing waste liquid d is fed to a second vacuum drying device 043 connected in series and remained moisture content is evaporated/removed/dried to separate it to a slurry-like plating residue e and a distilled drain f. Removed and captured distilled water b from the first vacuum drying device 041 is passed through a cleaning (water-purifying) device 05 to clean it. Distilled captured water f at the second vacuum drying device 043 is returned to a plating washing waste liquid storage tank 02 and is treated in the first vacuum drying device 041. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003211149(A) 申请公布日期 2003.07.29
申请号 JP20020019119 申请日期 2002.01.28
申请人 DAIWA KAGAKU KOGYO KK 发明人 DOI JUNICHI;SHIMIZU TOSHIYA;WATANABE HIROYUKI
分类号 C02F1/04;B01D3/10;C25D21/20;(IPC1-7):C02F1/04 主分类号 C02F1/04
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