Exposure apparatus, a photolithography method, and a device manufactured by the same

摘要

The present invention is directed to a batch type projection exposure apparatus for being used with a scanning type exposure apparatus. The apparatus may include an illumination optical system and a projection optical system. The illumination optical system may have a light source that illuminates a mask with an exposure light from the light source, and the projection optical system may have an image field that projects a reduction image of a pattern on the mask onto the image field on a work piece. The image field may include a rectangular shaped pattern transfer area of the scanning type exposure apparatus. The projection optical system may also have a numerical aperture at the side of the work piece that is greater than or equal to 0.5 m, and a rectangular pattern transfer area which is same as the rectangular shaped pattern transfer area of the scanning type exposure apparatus. The rectangular pattern transfer area of the projection optical system may be encompassed within the image field on the projection optical system.