| 摘要 |
PROBLEM TO BE SOLVED: To improve cleaning power without damaging fine patterns on an object to be cleaned. SOLUTION: When cleaning an object (10) to be cleaned by blowing an aerosol 22 thereto, the aerosol 22 is accelerated by accelerating gases 26 and made to collide with the wafer 10 at a prescribed speed or faster than it. Thus, the cleaning power is improved by locally generating a supercritical state or pseudo supercritical state on the surface of the wafer 10. COPYRIGHT: (C)2003,JPO
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