发明名称 High performance source for electron beam projection lithography
摘要 The presence of magnetic fields from lenses and other (e.g. parasitic) sources at locations in a charged particle beam system such as the charged particle emitter, where the particles have little or no kinetic energy, creates disturbances of the charged particle trajectories, generating undesired angular momentum and resulting in excessive aberrations and associated adverse effects on system performance. Solutions are provided by suppression of these magnetic fields, by relocating the charged particle emitter away from the field source and/or counterbalancing the field with a bucking field. In addition, residual irrepressible field asymmetries are compensated by a suitable element such as a stigmator located at the correct location in the beam path, permitted by relocation of the charged particle emitter.
申请公布号 US6596999(B2) 申请公布日期 2003.07.22
申请号 US20010986176 申请日期 2001.11.07
申请人 NIKON CORPORATION 发明人 GOLLADAY STEVEN D.;GORDON MICHAEL S.;KENDALL RODNEY A.;KOJIMA SHINICHI;STICKEL WERNER
分类号 G21K1/00;G21K5/04;H01J37/07;H01J37/141;H01J37/153;H01J37/305;H01L21/027;(IPC1-7):H01J37/30 主分类号 G21K1/00
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