| 发明名称 |
NEGATIVE DEEP ULTRAVIOLET PHOTORESIST |
| 摘要 |
The present invention relates to a novel negative working deep uv photoresist that is developable in an aqueous alkaline solution, and comprises a fluorinated polymer, photoactive compound and a crosslinking agent. The photoresist composition is particularly useful for patterning with exposure wavelengths of 193 nm and 157 nm.
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| 申请公布号 |
WO03058347(A1) |
申请公布日期 |
2003.07.17 |
| 申请号 |
WO2003EP00021 |
申请日期 |
2003.01.03 |
| 申请人 |
CLARIANT INTERNATIONAL LTD;CLARIANT FINANCE (BVI) LIMITED |
发明人 |
KUDO, TAKANORI;PADMANABAN, MUNIRATHNA;DAMMEL, RALPH, R.;TOUKHY, MEDHAT, A. |
| 分类号 |
C08F32/08;G03F7/004;G03F7/033;G03F7/038;G03F7/38;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
C08F32/08 |
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