| 发明名称 |
FLUORINE-CONTAINING PHOTOSENSITIVE POLYMER HAVING HYDRATE STRUCTURE AND RESIST COMPOSITION CONTAINING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition containing the same. <P>SOLUTION: The photosensitive polymer has a weight average mol.wt. of 3,000-100,000 and comprises repeating units containing at least one group of the following structures (1) and (2). The resist composition containing the above photosensitive polymer is also provided. <P>COPYRIGHT: (C)2003,JPO |
| 申请公布号 |
JP2003192729(A) |
申请公布日期 |
2003.07.09 |
| 申请号 |
JP20020368107 |
申请日期 |
2002.12.19 |
| 申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
YOON KWANG-SUB;WOO SANG-GYUN;SONG KI-YONG;SANG-JUN CHOI |
| 分类号 |
C08F12/14;C08F32/04;C08F32/08;C08F212/06;C08F220/10;C08F232/08;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C08F12/14 |
| 代理机构 |
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代理人 |
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