| 摘要 |
PROBLEM TO BE SOLVED: To provide a spin process device of which the treatment liquid jetted from a nozzle is not contaminated. SOLUTION: The spin treatment device treats a substrate with treatment liquid while the substrate is rotated. It comprises a cup, a rotating table which is, provided in the cup, rotated while holding the substrate, a nozzle 21 which jets the treatment liquid toward the substrate held on the rotating table, a supply pipe 35 which supplies the treatment liquid to the nozzle, a bypass pipe 37 comprising a throttle valve 38 which makes the treatment liquid drop from the nozzle when jetting of the treatment liquid to the substrate from the nozzle is stopped. COPYRIGHT: (C)2003,JPO |
