| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning sheet for a substrate treatment apparatus that hates a foreign matter, such as a manufacturing apparatus of a semiconductor and a flat panel display and an inspection apparatus of a semiconductor and a flat panel display, and to provide a method for cleaning the substrate treatment apparatus using the cleaning sheet. SOLUTION: In the cleaning sheet having a protected film to which the silicone-based release treatment is applied on at least one surface of the cleaning layer bonded as a separator, the adhesion amount of the silicone of the cleaning layer in stripping the separator from the cleaning layer is 0.005 g/m<SP>2</SP>or less in terms of polydimethylsiloxane. COPYRIGHT: (C)2003,JPO |
