| 摘要 |
PURPOSE: An overlay measuring target and a method for measuring resolution using the same are provided to be capable of measuring the resolution of patterns formed in a photolithography process using a low cost overlay measuring equipment. CONSTITUTION: An overlay measuring target is provided with an overlay measuring basic target and a resolution pattern made of a plurality of unit patterns(103) having a predetermined thickness. At this time, the basic target for overlay measure includes an inner box(101) and an outer box(102) formed at the outer portion of the inner box(101). At the time, the unit patterns(103) are formed and separated from each other at the outer portion of the outer box(102). Preferably, the unit pattern includes a plurality of sub patterns(103a). Preferably, the inner box, out box, and unit pattern have a thickness of about 1μm, respectively.
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