发明名称 |
Post exposure method for enhancing durability of negative working lithographic plates |
摘要 |
The durability of negative working lithographic plates is enhanced by post-exposure to a wavelength, or a range of wavelengths, effective to promote further addition polymerization and/or cross-linking reactions. Preferably, the electromagnetic energy used for post-exposure comprises a principal wave length not greater than 300 nanometers.
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申请公布号 |
US2003118944(A1) |
申请公布日期 |
2003.06.26 |
申请号 |
US20020107681 |
申请日期 |
2002.03.27 |
申请人 |
WESTERN LITHO PLATE & SUPPLY CO. |
发明人 |
COPELAND HARRY;KRAMER CHARLES J.;MADOUX DAVID C.;STREETER WILLIAM J. |
分类号 |
G03F7/40;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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