SUBSTRATE HOLDING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

Upon exposure, according to a detection result of a focal point position detection system, a main control apparatus adjusts distortion of piezoelectric elements located in a region (projection region) where a reticle pattern is projected by a projection optical system among a plurality of piezoelectric elements constituting a wafer holder via a drive apparatus, thereby adjusting the convex/concave shape of the wafer surface. Thus, it is possible to suppress the convex/concave shape of the wafer surface in the projection region within a range of focal depth of the projection optical system. Accordingly, it is possible to suppress color irregularities caused by defocusing and improve the exposure accuracy.