发明名称 |
Etcher for semiconductor manufacturing |
摘要 |
The present invention provides an etcher for semiconductor manufacturing. The etcher comprises a chamber for accepting a wafer, having an inlet and outlet through which a gas is pumped into and out of the chamber, first and second electrodes generating an electrical field to ionize the gas for reacting with the wafer, and a plate disposed between the inlet and outlet, deflecting the gas flow therebetween.
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申请公布号 |
US2003111179(A1) |
申请公布日期 |
2003.06.19 |
申请号 |
US20020081339 |
申请日期 |
2002.02.22 |
申请人 |
WINBOND ELECTRONICS CORP. |
发明人 |
FANG MON-LONG;HUANG SUNG-HUI;LIN JENG-YIN;CHOU TING-WANG;HSU CHI-HOW |
分类号 |
H01J37/32;(IPC1-7):C23F1/00 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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