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发明名称
CHEMICAL VAPOR DEPOSITION REACTOR
摘要
申请公布号
AU2002353021(A1)
申请公布日期
2003.06.17
申请号
AU20020353021
申请日期
2002.12.04
申请人
PRIMAXX, INC.
发明人
ROBERT, W. GRANT;BENJAMIN, J. PETRONE;MATTHEW, D. BRUBAKER;PAUL, D. MUMBAUER
分类号
C23C16/44;C23C16/455;H01L21/31;(IPC1-7):C23C16/455
主分类号
C23C16/44
代理机构
代理人
主权项
地址
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