发明名称 |
Backside cannelure to provide for wafer shift detection |
摘要 |
A backside cannelure of an electrode to provide for detecting semiconductor wafer shift after the wafer has been positioned over the cannelure of the electrode is disclosed. The wafer has a backside and a proper position over the cannelure. The cannelure exposes the backside of the wafer to a gas piped in through one or more holes of the electrode. The cannelure has a size such that deviation of the wafer from its proper position by more than a threshold partially exposes the cannelure, such that the gas leaks from the cannelure as now partially exposed. A gas flow detector may detect the gas leaking from the cannelure, and provide corresponding detection of the wafer deviating from its proper position.
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申请公布号 |
US6576483(B1) |
申请公布日期 |
2003.06.10 |
申请号 |
US20020101909 |
申请日期 |
2002.03.19 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHOU CHING-HIAN;YUEN JEAN-HUR;HSIEH TSUNG-CHI;LIN YUNG-KAI |
分类号 |
G01B11/03;H01L21/00;H01L21/687;(IPC1-7):H01L21/00;G01R31/26;G01B11/14;B05C11/00 |
主分类号 |
G01B11/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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