发明名称 |
METHOD FOR FABRICATING PLASTIC SUBSTRATE |
摘要 |
PURPOSE: A plastic substrate fabricating method is provided to minimize the hydrogen content and the porosity of a barrier layer by local heat treatment without influencing on a plastic substrate, thereby forming a uniform film to restrain the permeation of external oxygen and moisture and preventing the deterioration of a display system. CONSTITUTION: A plastic substrate fabricating method includes the steps of forming barrier layers(30) of silicon on a transparent plastic substrate(20), and carrying out local heat treatment for the barrier layer for removing the defects of the barrier layers caused by a plurality of dangling bond and porosity generated by the incomplete bonding between silicon and oxygen or nitrogen during the barrier layer stacking. A desiccant layer is interposed between the plastic substrate and the barrier layers. |
申请公布号 |
KR20030044793(A) |
申请公布日期 |
2003.06.09 |
申请号 |
KR20020072581 |
申请日期 |
2002.11.20 |
申请人 |
CLD, INC. |
发明人 |
BYUN, BYEONG HYEON;CHOI, DO HYEON;CHOI, GYEONG HUI;LEE, SEUNG JUN;LIM, SEONG SIL |
分类号 |
G02F1/1333 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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