发明名称 Ceramic substrate
摘要 The present invention provides a ceramic substrate for use in an apparatus for manufacturing and inspecting semiconductors. The ceramic substrate comprises a through-hole having excellent tolerance performance against a drawing stress applied to an external terminal pin. The through-hole is provided with a projection which protrudes into the ceramic substrate made of aluminum nitride as primary component.
申请公布号 US2003104186(A1) 申请公布日期 2003.06.05
申请号 US20030345356 申请日期 2003.01.16
申请人 IBIDEN CO., LTD. 发明人 ITO YASUTAKA
分类号 H01L21/683;H01L23/498;H02N13/00;(IPC1-7):B32B3/00 主分类号 H01L21/683
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