| 摘要 |
An exposure apparatus includes a chuck having a holding surface for holding a substrate, a stage for holding the chuck, a moving mechanism for moving the stage, an urging mechanism for holding a whetstone and for urging the whetstone against the holding surface, a conveying mechanism for conveying the whetstone to the urging mechanism, and relay pins, retractably protruding from the holding surface. The relay pins, when protruding from the holding surface, are operable to relay the whetstone between the urging mechanism and the conveying mechanism. The stage is moved while the whetstone is urged against to the holding surface, for cleaning the holding surface.
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