发明名称 III-V nitride semiconductor device, and protection element and power conversion apparatus using the same
摘要 A GaN-based Schottky diode includes a sapphire substrate on which are formed a GaN buffer layer, an n+-type GaN layer, and an n-type GaN layer that has a surface portion thereof shaped to form a protrusion having an upper face with which a Ti electrode forms a Schottky junction and a side face with which a Pt electrode forms a Schottky junction through an Al0.2Ga0.8N layer. A cathode electrode constituted by a TaSi layer forms an ohmic junction with the n+-type GaN layer. The Ti and Pt electrodes constitute a combined anode electrode contributing to increasing a withstand voltage of and decreasing an on-voltage of the Schottky diode.
申请公布号 US2003098462(A1) 申请公布日期 2003.05.29
申请号 US20020293470 申请日期 2002.11.14
申请人 THE FURUKAWA ELECTRIC CO., LTD. 发明人 YOSHIDA SEIKOH
分类号 H01L21/285;H01L21/329;H01L29/20;H01L29/47;H01L29/872;(IPC1-7):H01L31/032 主分类号 H01L21/285
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