发明名称 ELECTRON SOURCE SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND IMAGE FORMING DEVICE USING ELECTRON SOURCE SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To control diffusion of wiring metal on an electron emission element film (dielectric thin film) of wiring metal and electron emission part causing deterioration of electron emission characteristics in an electron source substrate used as a electron beam source of a large screen flat type image forming device. SOLUTION: In the electron source substrate having an electron emission element composed of dielectric thin film 4 having a pair of element electrodes 2, 3 and an electron emission part 5 on the substrate 1, and metallic wires 6, 7 connected to the element electrode 2, 3 and composed of different composition from the element electrode, a shortest distance L along an interface of the element electrode 2, 3 and the substrate 1 between dielectric thin film 4 and metal wiring 6, 7 is set 50μm or less.</p>
申请公布号 JP2003151475(A) 申请公布日期 2003.05.23
申请号 JP20020240020 申请日期 2002.08.21
申请人 CANON INC 发明人 HACHISU TAKAHIRO
分类号 H01J9/02;H01J1/316;H01J29/04;H01J29/92;H01J31/12;(IPC1-7):H01J31/12 主分类号 H01J9/02
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