发明名称 Integrated schottky barrier diode and manufacturing method thereof
摘要 An integrated Schottky barrier diode chip includes a compound semiconductor substrate, a plurality of Schottky barrier diodes formed on the substrate and an insulating region formed on the substrate by an on implantation. The insulating region electrically separates a portion of a diode at a cathode voltage from a portion of the diode at an anode voltage. Because of the absence of a polyimide layer and trench structures, this planar device configuration results in simpler manufacturing method and improved device characteristics.
申请公布号 US2003094668(A1) 申请公布日期 2003.05.22
申请号 US20020283331 申请日期 2002.10.30
申请人 ASANO TETSURO;ONODA KATSUAKI;NAKAJIMA YOSHIBUMI;MURAI SHIGEYUKI;TOMINAGA HISAAKI;HIRATA KOICHI;SAKAKIBARA MIKITO;ISHIHARA HIDETOSHI 发明人 ASANO TETSURO;ONODA KATSUAKI;NAKAJIMA YOSHIBUMI;MURAI SHIGEYUKI;TOMINAGA HISAAKI;HIRATA KOICHI;SAKAKIBARA MIKITO;ISHIHARA HIDETOSHI
分类号 H01L21/329;H01L21/76;H01L27/06;H01L29/47;H01L29/872;(IPC1-7):H01L27/095 主分类号 H01L21/329
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