发明名称 GAS TREATMENT APPARATUS AND GAS TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a gas treatment apparatus capable of treating gas with high decomposition efficiency without applying special load to conventional constitution from an aspect of cost or the like, and a gas treatment method using the same. SOLUTION: The gas treatment apparatus is equipped with a reactor filled with a ferroelectric body having a structure permitting gas to pass and constituted so as to apply plasma treatment to the gas introduced from the gas inlet part of the reactor. The gas is treated on the gas inlet side of the reactor with gas decomposition efficiency higher than that of the other part in the reactor.
申请公布号 JP2003144911(A) 申请公布日期 2003.05.20
申请号 JP20010344677 申请日期 2001.11.09
申请人 CANON INC 发明人 MIYAMOTO MORITOSHI;NISHIGUCHI TOSHIMOTO;KANEKO YOSHIAKI
分类号 G21F9/02;B01D53/34;B01D53/72;B01J19/08;H05H1/24 主分类号 G21F9/02
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