| 摘要 |
PURPOSE: Provided is a method for contacting a whole surface of a photomask with a member to be exposed closely and quickly, while preventing the generation of air bubbles. CONSTITUTION: In the method, the movement of a pair of photomasks supporting members(52a,52b) are forcedly suppressed, in the state that a gap is formed between a pair of photomasks(51a,51b) and the member to be exposed(6) and the space including the gap is regarded as a closed chamber; the photomasks (51a,51b) are deflected by emitting the air in the closed chamber in the state of the movement suppression to contact with the member to be exposed(6) from their central parts; and then the contact areas of the photomasks(51a,51b) with the member to be exposed(6) are expanded successively toward a peripheral part, when the deflected photomasks(51a,51b) are restored by releasing the movement suppression on the frames(52a,52b).
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