发明名称 |
METHOD OF MANUFACTURING FINE STRUCTURE, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND APPARATUS FOR MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method by which a fine structure can be obtained. SOLUTION: A member (108) to be treated is exposed and its shape is changed by relatively moving a laser beam or electron beam (101) with respect to the member (108) to be treated and simultaneously and intermittently repeating the irradiation. At this time, a multiplicity of micro-ruggedness or recessed shapes are formed at the member (108) to be treated by using branching means (103) for branching one beam (108) to a plurality of beams (106 and 107), paralleling means (104) for converting a plurality of the beams respectively to beams progressing in parallel, and condenser means (105) for generating a plurality of microspots by condensing a plurality of the beams to the member (108) to be treated. |
申请公布号 |
JP2003131390(A) |
申请公布日期 |
2003.05.09 |
申请号 |
JP20020054571 |
申请日期 |
2002.02.28 |
申请人 |
SEIKO EPSON CORP |
发明人 |
NAGASAKA KIMIO;MIYAMAE AKIRA;KASEYA HIROYASU |
分类号 |
G02B5/18;G02B1/11;G03F1/26;G03F1/68;G03F7/20 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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