发明名称 Photocurable/thermosetting composition for forming matte film
摘要 A photocurable and thermosetting composition which is useful in forming a matte film and can be developed with an aqueous alkaline solution is provided. The composition comprises (A) a photosensitive prepolymer obtained by causing a saturated or unsaturated polybasic acid anhydride to react with a hydroxyl group of an esterification product of a novolak type epoxy compound and an unsaturated monocarboxylic acid, (B) a carboxyl group-containing copolymer resin, (C) a photopolymerization initiator, (D) a diluent, (E) a polyfunctional epoxy compound having at least two epoxy groups in its molecule, and, when necessary, (F) an inorganic filler. The composition may further comprise (G) an epoxy resin curing agent. This composition can be advantageously used for the formation of a solder resist on a printed circuit board.
申请公布号 US2003082355(A1) 申请公布日期 2003.05.01
申请号 US20020216802 申请日期 2002.08.13
申请人 IWAIDA SATORU;OHNO YOSHIHIRO;ISONO MASAYUKI;SEKIMOTO AKIO 发明人 IWAIDA SATORU;OHNO YOSHIHIRO;ISONO MASAYUKI;SEKIMOTO AKIO
分类号 C08F2/46;C08G59/14;C08G59/42;C09D11/00;C09D163/00;G03F7/032;G03F7/038;H05K3/28;(IPC1-7):C08F2/46;C08J3/28;C08K3/00;B32B3/00;B32B7/00;B32B15/00 主分类号 C08F2/46
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