发明名称 |
Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus |
摘要 |
Methods and devices are disclosed for evaluating image performance in a charged-particle-beam (CPB) microlithography apparatus. In the disclosed method, multiple knife-edge reference marks are defined by a plate positioned at an image plane. The reference marks are illuminated by measurement beamlets formed by an upstream subfield. The beamlets are scanned over the reference marks to produce a series of beam-current transmissions. Each beam-current transmission corresponds to a single beamlet being scanned over a corresponding reference mark. The beam-current transmissions are exclusive of one another. The series of transmissions is then detected and analyzed. The knife-edge reference marks may be positioned on the plate so that the relative distance between the reference marks and the corresponding beamlets progressively increases for each successively scanned mark. A dummy beam also may be defined on the upstream subfield. The reference marks of the plate may be apertures or constructed of a charged-particle-reflecting material. |
申请公布号 |
US2003075690(A1) |
申请公布日期 |
2003.04.24 |
申请号 |
US20020236318 |
申请日期 |
2002.09.05 |
申请人 |
NIKON CORPORATION |
发明人 |
YAHIRO TAKEHISA |
分类号 |
G03F1/08;G03F1/44;G03F7/20;H01J37/04;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01J37/304 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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