发明名称 |
Capacitor having a structure capable of restraining deterioration of dielectric film, semiconductor device having the capacitor and method of manufacturing the same |
摘要 |
A semiconductor device having a structure capable of restraining deterioration of a dielectric film of a capacitor even when annealing is performed in a hydrogen-containing atmosphere. This semiconductor device includes one electrode or a plurality of dispersion electrodes formed in a dispersed manner above a semiconductor substrate, and a plate electrode commonly facing the one electrode or dispersion electrodes via respective dielectric films. This plate electrode includes a lower conductive layer formed on the dielectric films, a barrier layer formed on the lower conductive layer and an upper conductive layer formed on the barrier layer.
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申请公布号 |
US6548844(B1) |
申请公布日期 |
2003.04.15 |
申请号 |
US20000595029 |
申请日期 |
2000.06.16 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
FUKUZUMI YOSHIAKI;KOHYAMA YUSUKE |
分类号 |
H01L27/105;H01L21/02;H01L21/8242;H01L21/8246;H01L27/108;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/119 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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