发明名称 Capacitor having a structure capable of restraining deterioration of dielectric film, semiconductor device having the capacitor and method of manufacturing the same
摘要 A semiconductor device having a structure capable of restraining deterioration of a dielectric film of a capacitor even when annealing is performed in a hydrogen-containing atmosphere. This semiconductor device includes one electrode or a plurality of dispersion electrodes formed in a dispersed manner above a semiconductor substrate, and a plate electrode commonly facing the one electrode or dispersion electrodes via respective dielectric films. This plate electrode includes a lower conductive layer formed on the dielectric films, a barrier layer formed on the lower conductive layer and an upper conductive layer formed on the barrier layer.
申请公布号 US6548844(B1) 申请公布日期 2003.04.15
申请号 US20000595029 申请日期 2000.06.16
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 FUKUZUMI YOSHIAKI;KOHYAMA YUSUKE
分类号 H01L27/105;H01L21/02;H01L21/8242;H01L21/8246;H01L27/108;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/119 主分类号 H01L27/105
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