发明名称 SUBSTRATE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a device capable of eliminating useless consumption of a treatment liquid in a treatment system for discharging treatment liquid from a liquid outlet to a substrate, while scanning a treatment liquid discharge nozzle having the liquid outlet in which slit-like or a plurality of small holes are juxtaposed. SOLUTION: A collecting container 30 for collecting a developer discharged out of a wafer face from a slit-like liquid outlet 26 of a developer discharge nozzle 24 on the periphery of a developing cup 16 arranged so as to surround a wafer W held on a wafer holding part 10.
申请公布号 JP2003109894(A) 申请公布日期 2003.04.11
申请号 JP20020035183 申请日期 2002.02.13
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TAMADA OSAMU;MIHASHI TAKESHI
分类号 G03F7/30;B05C11/08;B05C11/10;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/30
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