| 发明名称 |
ATMOSPHERIC PRESSURE RF PLASMA SOURCE USING AMBIENT AIR AND COMPLEX MOLECULAR GASES |
| 摘要 |
An atomospheric pressure rf plasma processor (4) in which a plasma is created between two electrodes (2,8) using high frequency rf power (8), and a mixture of gases with a complex molecular gas as the majority component of the mixture of gases. |
| 申请公布号 |
WO02078749(A3) |
申请公布日期 |
2003.04.10 |
| 申请号 |
WO2002US08752 |
申请日期 |
2002.03.21 |
| 申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
PARK, JAEYOUNG;HENINS, IVARS |
| 分类号 |
A23L3/26;A61L2/00;A61L2/14;H01S3/097 |
主分类号 |
A23L3/26 |
| 代理机构 |
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