DEPOSITION METHOD AND DEPOSITION SYSTEM FOR OPTICAL THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a deposition method which is capable of efficiently forming an optical thin film consisting of an oxidized film without requiring systems of intricate structures and process steps over multiple stages and a deposition system for the same. SOLUTION: A deposition process step of depositing Ti on a glass substrate 4 by using a reactive sputtering process using a gaseous mixture composed of O2 or O3 and Kr as reaction gas and sputtering Ti targets 5a and 5b by sputtering gas consisting of gaseous Ar and oxidation process step of oxidizing the thin film on the substrate 4 by irradiating the reaction gas with microwaves by a microwave excitation plasma source 8 to excite the O2 or O3 and Kr to a plasma state are alternately repeated.