发明名称 SILICONE RESINS AND POROUS MATERIALS PRODUCED THEREFROM
摘要 <p>Silicone resins having the general formula (R1SiO3/2)y where R1 is an alkyl group having 8 to 24 carbon atoms; x has a value of 0.05 to 0.7; y has a value of 0.3 to 0.95 and x+y = 1. The resins are used to form porous ceramic materials and porous thin films on semiconductor devices.</p>
申请公布号 WO2003023831(A1) 申请公布日期 2003.03.20
申请号 US2002027755 申请日期 2002.08.29
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