发明名称
摘要 <p>PURPOSE:To provide the X-ray mask with a reflection preventing film, which has the excellent pattern positional accuracy without danger of breakage, by respectively providing a reflection preventing film between an X-ray transmitting support film and an X-ray absorbing body pattern and between the X-ray transmitting support film and a frame, and forming the X-ray transmitting support film of a silicone nitride film, and forming the reflection preventing film of a film having resistance to the alkali solution. CONSTITUTION:An X-ray mask has a frame 5', an X-ray transmitting support film 3, which is supported by the frame 5' and which is made of the material composed of light element, and an X-ray absorbing body pattern 1, which is provided on the X-ray transmitting support film and which is made of heavy metal. A reflection preventing film to the alignment light is provided as a reflection preventing film 2 for the main surface side of the X-ray transmitting support film between the X-ray transmitting support film 3 and the X-ray absorbing body pattern 1, and a reflection preventing film is provided as a reflection preventing film 4 for the back surface of the X-ray transmitting support film between the X-ray transmitting support film 3 and the frame 5'. The X-ray transmitting support film 3 is made of silicone nitride film, and the reflection preventing film 4 for the back surface of the X-ray transmitting support film is made of a film having the sufficient resistance to the hot alkali solution, namely, a sialon film.</p>
申请公布号 JP3387222(B2) 申请公布日期 2003.03.17
申请号 JP19940166812 申请日期 1994.07.19
申请人 发明人
分类号 G03F1/50;G03F1/68;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/50
代理机构 代理人
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