| 摘要 |
PURPOSE: Provided is a scanner type exposure apparatus, which can reduce a location error by changing the location of a mask blade, therefore the error of field image can be minimized. CONSTITUTION: The scanner type exposure apparatus contains: a light source(10); a beam shaping unit(20) for forming the light from the light source(10) into a fixed shape; a reticle unit(30) having a reticle(22) and the mask blade(24), which is located in the channel passing the light passed through the beam shaping unit(20), wherein the mask blade(24) is placed right on the reticle(22); a projection lens part(40) throwing the light passed through the reticle on a wafer; a wafer stage(50) moving the wafer, which is located under the projection lens part(40). |
