| 摘要 |
PROBLEM TO BE SOLVED: To solve a problem that although the production process of a liquid crystal panel employing a thin film transistor comprises a patterning process employing resist, the line width of pattern is made extremely fine as the number of pixels increases and the effect of unevenness of the pattern due to temperature variation at the time of baking the resist has become relatively significant as compared with a conventional case and thereby unevenness of the resist temperature must be kept below a specified level for a resist applied to a large glass substrate. SOLUTION: In the baking process of resist applied onto the surface of a substrate 1, degree of evaporation of a solvent contained in the resist becomes uniform in the substrate because the substrate 1 is supported alternately by two supporting pin groups 21 and 22 designed to support the substrate 1 at different positions and thereby the line width of a resist pattern becomes uniform in the substrate after developing the resist. |
