| 摘要 |
PURPOSE: Provided is a photosensitive resin composition which has excellent abilities such as insulation, smoothness, chemical resistance, and so on, and is easy to form a pattern as an interlayer insulating film. CONSTITUTION: The photosensitive resin composition comprises (A) (i) acrylic copolymer having a weight average molecular weight determined in terms of polystyrene of 5000-20000, in which an area of unreacted monomer of copolymer and polymerization initiator is 5% or less(wherein (i) unsaturated carbonic acid, unsaturated carbonic acid anhydride, or a mixture thereof, (ii) epoxy group containing unsaturated compound, and (iii) olefin-based, unsaturated compound); and (B) 1,2-quinone diazide compound. The resin composition is effective as interlayer insulating film in LCD(liquid crystal device) manufacturing process.
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