| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-cleaning apparatus, capable of surely cleaning a substrate by promptly detecting the distribution state of particles on the substrate. SOLUTION: A substrate-cleaning apparatus comprises an indexer part 11; a surface cleaning part 15 for washing a surface of a substrate W; a back- surface cleaning part 16 for cleaning the back-surface of the substrate W; a particle inspection part 16 for detecting a distribution state of particles adhered to the substrate W; a reverse part 18 for turning the substrate W upside down; a conveyance part 14 comprising a pair of conveying units 12, 13. On the basis of the distribution state of particles in the substrate W after the surface-cleaning part 15 or the back-surface cleaning part 16 washed it and the particle inspection part 17 inspected it, the cleaning conditions in the surface cleaning part 15 or the back-surface cleaning part 16 are changed.
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