Photomask, method for manufacturing the same and method for detecting/repairing defects in photomask

摘要

A photomask includes a mask substrate formed of a transparent nonconductor, a plurality of opaque conductive patterns formed on the mask substrate and separated from one another, and one or more conductive lines for connecting one of the conductive patterns with at least one adjacent conductive patterns. Electric charges, which accumulate in conductive patterns when using a focused ion beam (FIB) system, are dispersed through the conductive lines. The contrast of images of photomask patterns is increased by dispersion of electric charges, thereby improving the images of photomask patterns.