LAMINATED POLYESTER FILM FOR PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide a laminated polyester film for a photoresist as a base film having excellent winding property of the film and giving excellent resolution when used for a photoresist. SOLUTION: The laminated polyester film for a photoresist is composed of at least two layers and both layers of the top layer (A) and the back layer (B) contain inorganic particles having >=8 Mohs hardness and 0.001 to 0.5 μm average particle size. The proportion of the inorganic particles is 0.1 to 10 wt.% with respect to the polyester in each of the top and back layer. The average surface roughness Ra of the top layer (A) is >=0.005 μm, while the average surface roughness Ra of the back layer (B) is <=0.05 μm. The thickness of the layers shows the relation of (A)<(B). The haze of the film is <=2.0%.