发明名称 SYSTEM, DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To maintain a clean room in a clean and pure atmosphere. SOLUTION: A semiconductor manufacturing system is provided with the clean room 1 in which a semiconductor is manufactured and a semiconductor manufacturing device 20 using a material that does not emit chemical contaminants. The manufacturing device 20 is installed in the clean room 1. Since no chemical contaminant is emitted into the room 1 from the device 20, the inside of the room 1 can be maintained in the clean and pure atmosphere. In addition, the occurrence of defects in the semiconductor, the quality and reliability deterioration of the semiconductor, and declines in availability factor of the manufacturing line of the semiconductor caused by chemical contaminants can be reduced as compared with the case where the semiconductor is manufactured by using another semiconductor manufacturing device 20 using a material that emits chemical contaminants.
申请公布号 JP2003042498(A) 申请公布日期 2003.02.13
申请号 JP20010232659 申请日期 2001.07.31
申请人 SONY CORP 发明人 KATO TAIJI;SUZUKI TOSHIKAZU;KORIYAMA HIROHISA
分类号 F24F7/06;C09D4/02;F24F3/16;H01L21/02;(IPC1-7):F24F7/06 主分类号 F24F7/06
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